极速赛车2期计划

极速赛车走势

极速赛车官方

We offer high-performance plating equipment that supports cutting-edge plating technology.

We offer various types of wafer plating equipment in accordance with a customer’s needs, from mass-production systems to prototyping or low-volume production. Our comprehensive plating system focuses on compatibility with chemical processes and, with its high performance, is capable of coping with advancing technology such as wafers of increasing diameters and decreasing chip sizes.

极速赛车数据

极速赛车稳赚方法

POSFER E
  • Stir-cup equipped with paddle stirring mechanism inside cup
    (Suitable for bumps, vias, rewiring, W-CSP and MEMS)
  • Wafer size : 100-200 mm

极速赛车开彩结果历史

极速赛车在线官网

Stir CUP-PLATER/CUP-PLATER
  • Systems available for prototyping to production on a mass scale
  • Semi-automatic type with high practicality and maintainability
  • Wafer Size:100-300 mm

极速赛车数据

极速赛车开奖网址

POSFER C/M
  • Fully automated system for single-and multi-layer plating
  • Designed for easy production scale-up
  • High operability with selectable automatic and manual modes
  • Wafer Size: 100-200 mm

极速赛车历史结果

极速赛车开奖规律

POSFER C-ST
  • Compact and single-frame structure for medium-volume production
  • Our company’s smallest fully automated system
  • Stir-Cupequipped with paddle stirring mechanism inside cup
  • WaferSize:100-200 mm

极速赛车冷热号统计

极速赛车开奖结果下载

RAD-Plater
  • Stir-Cupequipped with paddle stirring mechanism inside cup
  • Can be operated with 10 L of plating solution
  • Easy installation with 100 V power supply and air
  • Via filling property of high aspect is good

极速赛车网页计划

Contact us for further information or materials (24 hours a day)
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